69th Annual SVC Technical Conference • April 25 - 30, 2026

Education Program • April 25 - 30 | Technology Exhibit • April 28 - 29

Plasma Processing and Diagnostics

This session welcomes contributions focused on the development, understanding, and application of plasma-based techniques for thin film coatings and surface modification. The scope includes both established and emerging approaches for plasma-enhanced deposition and treatment, emphasizing the underlying physical and chemical processes, diagnostics, and modeling strategies that enable performance optimization and scalability in industrial environments.

Topics of interest include:

  • Physical vapor deposition (PVD) including magnetron sputter-deposition in conventional and non-conventional arrangements,
  • Plasma-enhanced or chemical vapor deposition (PECVD) both on process and application side,
  • Plasma-based etching in the semiconductor industry and other applications,
  • Development of novel plasma sources for materials processing (e.g., mid-pressure, atmospheric pressure, nanosecond-pulsing, micro plasmas, etc.),
  • Hybrid systems and hybrid processes integrating different plasma technologies,
  • Atmospheric-pressure plasma processing, including dielectric-barrier discharges and plasma jets,
  • Plasma diagnostics for understanding plasma dynamics and plasma-material interaction,
  • Modelling and simulation of plasma-surface interactions, and
  • Novel plasma processing methods such as treatments of nanoparticles, nanomaterials, and liquids, as well as plasma catalysis.

This session is particularly relevant for industry practitioners, researchers, and scientists:

  • Working on the design, scale-up, and implementation of advanced plasma sources and coating technologies,
  • Developing novel plasma-based processes or deposition techniques, and
  • Engaged in the experimental diagnostics of laboratory or industrial plasma systems.

By fostering a technical exchange among these communities, the session aims to advance both the fundamental science and practical applications of plasma processing in thin film technologies.


Plasma Processing and Diagnostics TAC Co-Chairs: Hana Baránková, Uppsala University, hana.barankova@angstrom.uu.se; Kristina Tomanková, PlasmaSolve s.r.o., tomankova@plasmasolve.comOleg Zabeida, Polytechnique Montreal, oleg.zabeida@polymtl.caAssistant TAC Co-Chairs: Lenka Zajickova, Central European Institute of Technology & Masaryk University, lenkaz@physics.muni.czCraig A. Outten, Universal Display Corporation, coutten@verizon.net