High Power Impulse Magnetron Sputtering – HIPIMS

High Power Impulse Magnetron Sputtering (HIPIMS) has moved from lab scale to industry. Today, a significant number of industrial-scale HIPIMS processes exist as well as some commercial processes and products. Both fundamental understanding and application-oriented development are essential for exploiting the full potential of this technology.

The latest results from fundamental research, new and advanced approaches for simulation and modeling, and the combination of applied research from lab scale to industrial size cathodes and machines are the focus of this TAC. The session aims to provide a forum linking scientists, technologists, and industrialists to discuss all aspects of the HIPIMS technology.

Papers are solicited for, but not limited to, the following areas:

  • Fundamental research on plasma, discharge, and coatings
  • Simulation and modeling of HIPIMS
  • New plasma sources and process modifications
  • Recent development in pulse generation and process and plasma diagnostics
  • Application oriented results: tribological, optical, medical, etc.
  • New coatings and products

HIPIMS TAC Chair: Arutiun P. Ehiasarian, Sheffield Hallam University, United Kingdom, a.ehiasarian@shu.ac.ukAssistant TAC Chairs: Ju-Liang He, Feng Chia University, Taiwan, jlhe@fcu.edu.tw; and Jolanta Klemberg-Sapieha, Polytechnique Montréal, Canada, jsapieha@polymtl.ca; Ralf Bandorf, Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany, ralf.bandorf@ist.fraunhofer.de